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Almere, Netherlands

Asm International N.v.

USPTO Granted Patents = 313

% Expired Patents = 7.0

EPO Patents = 25

Trademarks = 24

Forward Citations = 38,532

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211 inventors (with patents filed for the assignee):

Suvi P Haukka (71 out of 177 patents)

Pekka T Soininen (38 out of 95 patents)

Kai-Erik Elers (30 out of 47 patents)

4. Marko J Tuominen (29 out of 84 patents)

5. Mikko Ritala (24 out of 83 patents)

6. Vladimir Ivanovich Kuznetsov (24 out of 27 patents)

7. Ivo Johannes Raaijmakers (24 out of 108 patents)

8. Markku Leskelä (22 out of 75 patents)

9. Antti Niskanen (20 out of 68 patents)

10. Ernst H A Granneman (20 out of 22 patents)

11. Ernst Hendrik August Granneman (17 out of 17 patents)

12. Frank Huussen (17 out of 19 patents)

13. Eva E Tois (16 out of 71 patents)

14. Timo Hatanpää (15 out of 48 patents)

15. Tom E Blomberg (15 out of 63 patents)

Core Competencies:

Atomic Layer Deposition

Thin Films

Precursors

Metallic Films

Doped Silicon Oxide

Transition Metal Oxides

Noble Metals

Dielectric Films

Strontium Titanate

Nickel Silicide

Carbon Nanotubes

CVD

313 patents: Sort by Forward Citations

1. 11814400 - Synthesis and use of precursors for ALD of tellurium and selenium thin films (2023-11-14),

2. 11555242 - Precursors and methods for atomic layer deposition of transition metal oxides (2023-01-17),

3. 11549177 - Process for passivating dielectric films (2023-01-10),

4. 11339474 - Atomic layer deposition apparatus and method for processing substrates using an apparatus (2022-05-24),

5. 11302527 - Methods for forming doped silicon oxide thin films (2022-04-12),

6. 11072622 - Synthesis and use of precursors for ALD of tellurium and selenium thin films (2021-07-27),

7. 11056385 - Selective formation of metallic films on metallic surfaces (2021-07-06),

8. 10964534 - Enhanced thin film deposition (2021-03-30),

9. 10858738 - Wafer boat cooldown device (2020-12-08),

10. 10837107 - Method and apparatus for contactlessly advancing substrates (2020-11-17),

11. 10784105 - Methods for forming doped silicon oxide thin films (2020-09-22),

12. 10738382 - Substrate processing apparatus (2020-08-11),

13. 10707082 - Methods for depositing thin films comprising indium nitride by atomic layer deposition (2020-07-07),

14. 10699899 - Atomic layer deposition of antimony oxide films (2020-06-30),

15. 10648078 - Atomic layer deposition apparatus and method for processing substrates using an apparatus (2020-05-12),

Company Overview

ASM International N.V., headquartered in Almere, Netherlands, specializes in advanced semiconductor manufacturing technologies, particularly in atomic layer deposition (ALD). The company focuses on developing innovative solutions for thin film deposition, including metallic films, dielectric films, and various precursors. With expertise in materials such as doped silicon oxide and transition metal oxides, ASM plays a crucial role in enhancing the performance and efficiency of semiconductor devices, catering to the evolving needs of the electronics industry.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

313 Patents

#2 in Almere

#26 in Netherlands

#2,867 in the World

Almere, Netherlands

Asm International N.v.

Forward Citations = 38,532

211 inventors:

Suvi P Haukka (71 out of 177 patents)

Pekka T Soininen (38 out of 95 patents)

Kai-Erik Elers (30 out of 47 patents)

4. Marko J Tuominen (29 out of 84 patents)

5. Mikko Ritala (24 out of 83 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Asm International N.v.. Retrieved from https://idiyas.com/company/asm-international-n-v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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