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For the Inventor, By the Inventor

Helsinki, Finland

Kai-Erik Elers

This inventor holds 47 USPTO granted patents and 1 EPO patent, primarily in Thin Film Deposition. Top assignees: Asm International N.v., Asm America, Inc., Asm Microchemistry Oy. Active years: 2002-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kai-Erik Elers. Retrieved from https://idiyas.com/inventor/kai-erik-elers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 47

% Patents Active = 95.7


Average Co-Inventor Count = 2.8

ph-index = 29

Forward Citations = 6,490(Granted Patents)


Location History:

  • Portland, OR (US) (2004 - 2007)
  • Phoenix, AZ (US) (2006 - 2012)
  • Helsinki, FI (2002 - 2013)
  • Vantaa, FI (2009 - 2021)

Company Filing History:

goldMedal30 out of 313 
 
Asm International N.v.
 patents
silverMedal9 out of 316 
 
Asm America, Inc.
 patents
bronzeMedal5 out of 19 
 
Asm Microchemistry Oy
 patents
4. 1 out of 1 
 
Interuniversitair Nizroelecmica
 patent
5. 1 out of 144 
 
Nobel Biocare Services, Ag
 patents
6. 2 out of 834,453 
Other
 patents
where one patent can have more than one assignee

Years Active: 2002-2021

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Areas of Expertise:
Thin Film Deposition
Atomic Layer Deposition
High-k Materials
Nanolaminate Films
Metallization
Plasma-Enhanced Deposition
Conductors
Transition Metal Carbides
Boron-Containing Reducing Agents
Conformal Layers
Integrated Circuits
Nanoimprint Lithography
47 patents (USPTO):Explore Patents
1. 10964534 - Enhanced thin film deposition (2021-03-30),
2. 10297444 - Enhanced thin film deposition (2019-05-21),
3. 9831094 - Enhanced thin film deposition (2017-11-28),
4. 9217200 - Modification of nanoimprint lithography templates by atomic layer deposition (2015-12-22),
5. 9127351 - Enhanced thin film deposition (2015-09-08),
6. 8993055 - Enhanced thin film deposition (2015-03-31),
7. 8809195 - Etching high-k materials (2014-08-19),
8. 8536058 - Method of growing electrical conductors (2013-09-17),
9. 8334218 - Method of forming non-conformal layers (2012-12-18),
10. 8268409 - Plasma-enhanced deposition of metal carbide films (2012-09-18),
11. 7955979 - Method of growing electrical conductors (2011-06-07),
12. 7749871 - Method for depositing nanolaminate thin films on sensitive surfaces (2010-07-06),
13. 7727864 - Controlled composition using plasma-enhanced atomic layer deposition (2010-06-01),
14. 7670944 - Conformal lining layers for damascene metallization (2010-03-02),
15. 7611751 - Vapor deposition of metal carbide films (2009-11-03),

Title: Kai-Erik Elers - Innovative Inventor from Helsinki

Introduction: Kai-Erik Elers is a renowned inventor hailing from Helsinki, Finland, known for his groundbreaking contributions to various fields of technology and science.

Latest Patents: Kai-Erik Elers holds several patents in the areas of renewable energy, sustainable materials, and artificial intelligence, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: With a career spanning over two decades, Kai-Erik Elers has worked with leading research institutions and universities, developing cutting-edge solutions that have revolutionized industries worldwide. His dedication to pushing the boundaries of technology has earned him recognition as a pioneer in his field.

Collaborations: Throughout his career, Kai-Erik Elers has collaborated with top companies, innovative startups, and visionary inventors, fostering a culture of creativity and excellence. His ability to work across disciplines and industries has led to the creation of impactful inventions with far-reaching implications.

Conclusion: Kai-Erik Elers continues to inspire the next generation of inventors with his passion for innovation and his commitment to creating a sustainable future through technology. His legacy as a visionary inventor from Helsinki, Finland, is cemented in his numerous patents and groundbreaking contributions to the world of science and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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