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For the Inventor, By the Inventor

Espoo, Finland

Markku Leskelä

This inventor holds 74 USPTO granted patents and 10 published patent applications and 3 EPO patents, primarily in Atomic Layer Deposition. Top assignees: Asm IP Holding B.v., Asm International N.v., Asm Microchemistry Oy. Active years: 1994-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markku Leskelä. Retrieved from https://idiyas.com/inventor/markku-leskela

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 74 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.8

ph-index = 11

Forward Citations = 1,624(Granted Patents)

Forward Citations (Not Self Cited) = 1,512(Dec 10, 2025)


Company Filing History:

goldMedal49 out of 1,312 
 
Asm IP Holding B.v.
 patents
silverMedal22 out of 313 
 
Asm International N.v.
 patents
bronzeMedal1 out of 19 
 
Asm Microchemistry Oy
 patents
4. 1 out of 180 
 
Neste Oy
 patents
5. 1 out of 16,275 
 
USA as Represented by Secretary of the Navy
 patents

Years Active: 1994-2026

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Areas of Expertise:
Atomic Layer Deposition
Vapor Deposition
Thin Films
Transition Metals
Cyclical Deposition
Chalcogenides
Metallic Films
Semiconductor Structures
Precursor Synthesis
Organic Material Removal
Metal-Containing Materials
Gap Filling Methods
74 patents (USPTO):Explore Patents
1. 12565466 - Synthesis and use of precursors for vapor deposition of tungsten containing thin films (2026-03-03),
2. 12532674 - Methods and apparatus for depositing a chalcogenide film and structures including the film (2026-01-20),
3. 12365988 - Atomic layer deposition and etching of transition metal dichalcogenide thin films (2025-07-22),
4. 12365981 - Synthesis and use of precursors for ALD of molybdenum or tungsten containing thin films (2025-07-22),
5. 12230506 - Area selective organic material removal (2025-02-18),
6. 12209305 - Deposition of transition metal—comprising material (2025-01-28),
7. 12173402 - Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus (2024-12-24),
8. 12119220 - Methods for filling a gap feature on a substrate surface and related semiconductor structures (2024-10-15),
9. 12106965 - Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures (2024-10-01),
10. 11959171 - Methods of forming a transition metal containing film on a substrate by a cyclical deposition process (2024-04-16),
11. 11952658 - Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material (2024-04-09),
12. 11821084 - Atomic layer deposition of rhenium containing thin films (2023-11-21),
13. 11814715 - Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material (2023-11-14),
14. 11814400 - Synthesis and use of precursors for ALD of tellurium and selenium thin films (2023-11-14),
15. 11694903 - Area selective organic material removal (2023-07-04),

Title: Markku Leskelä - Pioneering Inventor from Espoo, Finland

Introduction: Markku Leskelä is a distinguished inventor hailing from Espoo, Finland, known for his groundbreaking contributions to the field of innovation and technology.

Latest Patents: Markku Leskelä holds several patents in the areas of materials science, nanotechnology, and semiconductor technology, showcasing his continuous commitment to pushing the boundaries of scientific discovery.

Career Highlights: With a career spanning over three decades, Markku Leskelä has held key positions in various research institutions and universities, where he has spearheaded numerous research projects leading to significant technological advancements.

Collaborations: Throughout his career, Markku Leskelä has collaborated with leading experts in the industry, academic institutions, and research organizations, fostering a culture of innovation and knowledge sharing.

Conclusion: Markku Leskelä's relentless pursuit of innovation and his remarkable contributions to the field have solidified his position as a visionary inventor, inspiring the next generation of innovators to push the limits of what is possible in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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