The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2026

Filed:

Aug. 31, 2020
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Miika Mattinen, Helsinki, FI;

Mikko Ritala, Espoo, FI;

Markku Leskelä, Espoo, FI;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/30 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02568 (2013.01); C23C 16/305 (2013.01); C23C 16/45553 (2013.01); C23C 16/56 (2013.01); H01L 21/0262 (2013.01);
Abstract

Methods for depositing group 5 chalcogenides on a substrate are disclosed. The methods include cyclical deposition techniques, such as atomic layer deposition. The group 5 chalcogenides can be two-dimensional films having desirable electrical properties.


Find Patent Forward Citations

Mattinen, Miika. (2026). Methods and apparatus for depositing a chalcogenide film and structures including the film (U.S. Patent No. 12532674). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12532674

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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