This inventor holds 9 USPTO granted patents and 1 published patent application. Top assignee: Asm IP Holding B.v.. Active years: 2019-2026.
Company Filing History:
Years Active: 2019-2026
Title: Miika Mattinen: Innovator in Chalcogenide Film Technologies
Introduction
Miika Mattinen is a prominent inventor based in Helsinki, Finland. He has made significant contributions to the field of materials science, particularly in the development of chalcogenide films and their applications. With a total of 9 patents to his name, Mattinen's work is at the forefront of innovative technologies.
Latest Patents
Among his latest patents, one notable invention is titled "Methods and apparatus for depositing a chalcogenide film and structures including the film." This patent discloses methods for depositing group 5 chalcogenides on a substrate using cyclical deposition techniques, such as atomic layer deposition. These two-dimensional films exhibit desirable electrical properties, making them valuable in various applications. Another significant patent is "Synthesis and use of precursors for vapor deposition of tungsten containing thin films." This invention provides methods for synthesizing W(IV) beta-diketonate precursors and forming tungsten-containing thin films, such as WS, WN, WO, and W, through vapor deposition processes like atomic layer deposition and chemical vapor deposition.
Career Highlights
Miika Mattinen's career is marked by his innovative research and development efforts in the field of thin films and materials science. His work has not only advanced the understanding of chalcogenides but has also paved the way for new applications in electronics and optoelectronics.
Collaborations
Throughout his career, Mattinen has collaborated with esteemed colleagues, including Mikko Ritala and Markku Leskelä. These partnerships have fostered a collaborative environment that enhances the research and development of cutting-edge technologies.
Conclusion
In summary, Miika Mattinen is a distinguished inventor whose work in chalcogenide films and vapor deposition technologies has made a significant impact in the field of materials science. His innovative patents and collaborations continue to drive advancements in this important area of research.