The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
Oct. 24, 2022
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Katja Väyrynen, Helsinki, FI;
Timo Hatanpää, Espoo, FI;
Mikko Ritala, Espoo, FI;
Markku Leskelä, Espoo, FI;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/08 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/18 (2013.01); C23C 16/08 (2013.01); C23C 16/45531 (2013.01); C23C 16/45546 (2013.01); C23C 16/45553 (2013.01);
Abstract
A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system for forming the material are also disclosed.
Väyrynen, Katja. (2024). Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material (U.S. Patent No. 11952658). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11952658
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile