Helsinki, Finland

Katja Väyrynen

USPTO Granted Patents = 13 

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 281(Granted Patents)


Company Filing History:


Years Active: 2019-2024

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13 patents (USPTO):Explore Patents

Title: Katja Väyrynen: Innovator in Vapor Deposition Technologies

Introduction

Katja Väyrynen is a prominent inventor based in Helsinki, Finland. She has made significant contributions to the field of vapor deposition technologies, holding a total of 13 patents. Her work focuses on methods for forming transition metal-containing films on substrates, which are crucial in various semiconductor applications.

Latest Patents

Among her latest patents, Väyrynen has developed a method of forming a transition metal-containing film on a substrate by a cyclical deposition process. This method involves contacting the substrate with a first vapor phase reactant that includes a transition metal halide compound with a bidentate nitrogen-containing adduct ligand. Additionally, she has patented a method for supplying a transition metal halide compound to a reaction chamber, along with related vapor deposition apparatus. Another notable patent includes methods for forming a metallic film on a substrate by cyclical deposition, which may involve using a non-halogen containing metal precursor and a hydrocarbon-substituted hydrazine.

Career Highlights

Väyrynen's career is marked by her innovative approaches to vapor deposition processes. Her work has not only advanced the technology but has also contributed to the development of semiconductor device structures that utilize metallic interconnects formed through cyclical deposition processes.

Collaborations

Throughout her career, Katja has collaborated with notable colleagues such as Mikko Ritala and Markku Leskelä. Their joint efforts have further enhanced the research and development in the field of vapor deposition technologies.

Conclusion

Katja Väyrynen stands out as a leading inventor in the realm of vapor deposition, with her patents paving the way for advancements in semiconductor technologies. Her contributions continue to influence the industry and inspire future innovations.

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