The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2023
Filed:
Dec. 10, 2019
Applicant:
Asm International N.v., Almere, NL;
Inventors:
Tom E. Blomberg, Vantaa, FI;
Eva E. Tois, Espoo, FI;
Robert Huggare, Espoo, FI;
Jan Willem Maes, Wilrijk, BE;
Vladimir Machkaoutsan, Leuven, BE;
Dieter Pierreux, Dilbeek, BE;
Assignee:
ASM INTERNATIONAL, N.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C23C 16/36 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/34 (2013.01); C23C 16/36 (2013.01); C23C 16/409 (2013.01); C23C 16/45531 (2013.01); C23C 16/45527 (2013.01);
Abstract
Methods are disclosed herein for depositing a passivation layer comprising fluorine over a dielectric material that is sensitive to chlorine, bromine, and iodine. The passivation layer can protect the sensitive dielectric layer thereby enabling deposition using precursors comprising chlorine, bromine, and iodine over the passivation layer.
Blomberg, Tom. (2023). Process for passivating dielectric films (U.S. Patent No. 11549177). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11549177
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile