The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2020

Filed:

Mar. 18, 2014
Applicant:

Asm International N.v., Almere, NL;

Inventors:

Ernst Hendrik August Granneman, Almere, NL;

Pieter Tak, Almere, NL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01L 21/677 (2006.01); B65G 51/03 (2006.01); C23C 16/54 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); B65G 51/03 (2013.01); C23C 16/4412 (2013.01); C23C 16/45551 (2013.01); C23C 16/45557 (2013.01); C23C 16/54 (2013.01); H01L 21/67784 (2013.01);
Abstract

A substrate processing apparatus () comprising a process tunnel () including a lower tunnel wall (), an upper tunnel wall (), and two lateral tunnel walls (), said tunnel walls being configured to bound a process tunnel space () that extends in a longitudinal transport direction () and that is suitable for accommodating at least one substantially planar substrate () oriented parallel to the upper and lower tunnel walls (), the process tunnel being divided in a lower tunnel body () comprising the lower tunnel wall and an upper tunnel body () comprising the upper tunnel wall, which tunnel bodies () are separably joinable to each other along at least one longitudinally extending join (), such that they are mutually movable between a closed configuration in which the tunnel walls () bound the process tunnel space () and an open configuration that enables lateral maintenance access to an interior of the process tunnel.


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