Helsinki, Finland

Pekka T Soininen

USPTO Granted Patents = 94 

 

Average Co-Inventor Count = 2.7

ph-index = 37

Forward Citations = 9,014(Granted Patents)


Inventors with similar research interests:


Location History:

  • Helsinki, FI (1998 - 2020)
  • Espoo, FI (2002 - 2024)

Company Filing History:


Years Active: 1998-2025

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Areas of Expertise:
Atomic Layer Deposition
Thin Film Deposition
Vacuum Chamber
Precursor Source Arrangement
Plasma Etch-Resistant Film
Nanotube Production
Copper Interconnect Structure
Dielectric Layers
Integrated Circuits
Coating Precursor Nozzle
Showerhead Assembly
Surface Processing
94 patents (USPTO):Explore Patents

Title: Pekka T Soininen: Innovator Extraordinaire and Master of Patents

Introduction:

Throughout his illustrious career, Pekka T Soininen has consistently demonstrated his exceptional innovative abilities, leaving an indelible mark on the field of technology. Hailing from Helsinki, Finland, Soininen has garnered numerous accolades and achieved remarkable milestones. With a vast repertoire of patents to his name and involvement in esteemed companies, his contributions have been instrumental in shaping modern advancements in industrial technology. This article delves into his latest patents, career highlights, collaborations, and his invaluable impact on the field.

Latest Patents:

Continuously pushing boundaries, Soininen's recent patents exemplify his ingenious problem-solving skills. His invention, the "Nozzle and Nozzle Head," offers a groundbreaking approach to supply gas towards a substrate surface. The nozzle's design includes a nozzle output surface, a nozzle top surface, and a nozzle side wall with recesses for efficient gas passage. This innovation streamlines gas distribution processes in industrial applications.

Another notable patent, the "Atomic Layer Deposition Apparatus," introduces a cutting-edge system featuring a vacuum chamber, deposition chamber, and precise gas supply mechanisms. This apparatus offers significant advancements in atomic layer deposition techniques, allowing for enhanced control and precision in thin-film deposition processes.

Career Highlights:

Soininen's illustrious career has been enriched with distinguished positions in renowned companies. With his tenure at ASM International N.V., a prominent semiconductor equipment supplier, he made significant contributions to the advancement of semiconductor manufacturing technologies. His expertise proved vital in driving innovation within the industry.

Furthermore, Soininen's association with Beneq Oy further underlines his commitment to pushing technological boundaries. Positioned as a leading supplier of atomic layer deposition equipment, Soininen undoubtedly played a pivotal role in shaping the company's success and cementing its position as a prominent player in the field.

Collaborations:

Collaboration often breeds innovation, and Soininen has forged valuable partnerships throughout his career. Working alongside industry experts like Kai-Erik Elers and Suvi P Haukka, he has been part of groundbreaking advancements in the realm of industrial technology. These collaborations have not only facilitated the exchange of ideas but also fostered an environment focused on pioneering research and development.

Conclusion:

Pekka T Soininen's unmatched innovation, extensive patent portfolio, and successful collaborations have solidified his prominent position in the world of technology. His patents, such as the "Nozzle and Nozzle Head" and the "Atomic Layer Deposition Apparatus," demonstrate his profound understanding of complex industrial processes and his dedication to developing cutting-edge solutions.

Soininen's career highlights with esteemed companies like ASM International N.V. and Beneq Oy underscore his invaluable contributions to the advancement of industrial technology. As he continues to push boundaries and pioneer novel approaches, the future undoubtedly holds more remarkable achievements for this visionary inventor.

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