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For the Inventor, By the Inventor

Vantaa, Finland

Beneq Oy


USPTO Granted Patents = 65

% Expired Patents = 16.9


Trademarks = 11

Forward Citations = 61

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51 inventors (with patents filed for the assignee):

goldMedal Pekka T Soininen (30 out of 95 patents)

silverMedal Markku Rajala (8 out of 10 patents)

bronzeMedal Johannes Wesslin (7 out of 7 patents)

4.  Jarmo Maula (6 out of 13 patents)

5.  Mika Jauhiainen (5 out of 5 patents)

6.  Kai Asikkala (5 out of 5 patents)

7.  Hulda Aminoff (5 out of 7 patents)

8.  Jonas Andersson (5 out of 5 patents)

9.  Matti Malila (4 out of 4 patents)

10.  Leif Keto (4 out of 7 patents)

11.  Kari Härkönen (4 out of 17 patents)

12.  Olli Pekonen (3 out of 4 patents)

13.  Mikko Söderlund (3 out of 3 patents)

14.  Anssi Hovinen (3 out of 3 patents)

15.  Heikki Naulapää (3 out of 6 patents)


Core Competencies:
Atomic Layer Deposition
Coating Methods
Semiconductor Processing
Thin Film Display
Precursor Supply
Gas Distribution
Surface Treatment
Plasma Etch-Resistant Film
Aerosol Production
Nanotube Production
Electroluminescent Displays
Hydrophobic Surfaces

65 patents:

1. 12751221 - Semiconductor doping method and an intermediate semiconductor device (2026-09-29),
2. 12747499 - Atomic layer deposition apparatus (2026-09-29),
3. 12716130 - Precursor source arrangement and atomic layer deposition apparatus (2026-08-25),
4. 12590367 - Precursor supply chamber (2026-03-31),
5. 12460292 - Atomic layer deposition apparatus and a method (2025-11-04),
6. 12442081 - Nozzle head and apparatus (2025-10-14),
7. 12421596 - Method and apparatus for processing surface of a semiconductor substrate (2025-09-23),
8. 12180588 - Loading device, arrangement and method for loading a reaction chamber (2024-12-31),
9. 12180587 - Vacuum chamber and arrangement for atomic layer deposition (2024-12-31),
10. 12116668 - Atomic layer deposition reactor arrangement and a method for operating an atomic layer deposition reactor arrangement (2024-10-15),
11. 12104248 - Gas feeding cup and a gas manifold assembly (2024-10-01),
12. 12000043 - Precursor source arrangement and atomic layer deposition apparatus (2024-06-04),
13. 11970773 - Apparatus and method for atomic layer deposition (ALD) (2024-04-30),
14. 11926896 - Atomic layer deposition apparatus (2024-03-12),
15. 11762510 - Display arrangement and method (2023-09-19),
Beneq Oy, based in Vantaa, Finland, specializes in advanced atomic layer deposition (ALD) technology. The company develops innovative coating methods that are essential for semiconductor processing and thin film display applications. Beneq's expertise extends to precursor supply, gas distribution, and surface treatment, enabling the production of high-quality, etch-resistant films. With a strong focus on research and development, Beneq plays a pivotal role in enhancing the performance and reliability of various electronic components.
Profile summary based on public USPTO records.

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USPTO Data Jan 1 1976 - Sep 29 2026

Beneq Oy
65 Patents

#2 in Vantaa

#56 in Finland

#11,312 in the World

Vantaa, FI
Vantaa, Finland

Beneq Oy

Forward Citations = 61

51 inventors:

goldMedal Pekka T Soininen (30 out of 95 patents)

silverMedal Markku Rajala (8 out of 10 patents)

bronzeMedal Johannes Wesslin (7 out of 7 patents)

4.  Jarmo Maula (6 out of 13 patents)

5.  Mika Jauhiainen (5 out of 5 patents)

Please report any incorrect information to [email protected]
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