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Vantaa, Finland

Beneq Oy

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USPTO Granted Patents = 65

% Expired Patents = 16.9

EPO Patents = 31

Trademarks = 11

Forward Citations = 61

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51 inventors (with patents filed for the assignee):

Pekka T Soininen (30 out of 95 patents)

Markku Rajala (8 out of 10 patents)

Johannes Wesslin (7 out of 7 patents)

4. Jarmo Maula (6 out of 13 patents)

5. Mika Jauhiainen (5 out of 5 patents)

6. Kai Asikkala (5 out of 5 patents)

7. Hulda Aminoff (5 out of 7 patents)

8. Jonas Andersson (5 out of 5 patents)

9. Matti Malila (4 out of 4 patents)

10. Leif Keto (4 out of 7 patents)

11. Kari Härkönen (4 out of 17 patents)

12. Olli Pekonen (3 out of 4 patents)

13. Mikko Söderlund (3 out of 3 patents)

14. Anssi Hovinen (3 out of 3 patents)

15. Heikki Naulapää (3 out of 7 patents)

Core Competencies:

Atomic Layer Deposition

Coating Methods

Semiconductor Processing

Thin Film Display

Precursor Supply

Gas Distribution

Surface Treatment

Plasma Etch-Resistant Film

Aerosol Production

Nanotube Production

Electroluminescent Displays

Hydrophobic Surfaces

65 patents: Sort by Forward Citations

1. 12751221 - Semiconductor doping method and an intermediate semiconductor device (2026-09-29),

2. 12747499 - Atomic layer deposition apparatus (2026-09-29),

3. 12716130 - Precursor source arrangement and atomic layer deposition apparatus (2026-08-25),

4. 12590367 - Precursor supply chamber (2026-03-31),

5. 12460292 - Atomic layer deposition apparatus and a method (2025-11-04),

6. 12442081 - Nozzle head and apparatus (2025-10-14),

7. 12421596 - Method and apparatus for processing surface of a semiconductor substrate (2025-09-23),

8. 12180588 - Loading device, arrangement and method for loading a reaction chamber (2024-12-31),

9. 12180587 - Vacuum chamber and arrangement for atomic layer deposition (2024-12-31),

10. 12116668 - Atomic layer deposition reactor arrangement and a method for operating an atomic layer deposition reactor arrangement (2024-10-15),

11. 12104248 - Gas feeding cup and a gas manifold assembly (2024-10-01),

12. 12000043 - Precursor source arrangement and atomic layer deposition apparatus (2024-06-04),

13. 11970773 - Apparatus and method for atomic layer deposition (ALD) (2024-04-30),

14. 11926896 - Atomic layer deposition apparatus (2024-03-12),

15. 11762510 - Display arrangement and method (2023-09-19),

Company Overview

Beneq Oy, based in Vantaa, Finland, specializes in advanced atomic layer deposition (ALD) technology. The company develops innovative coating methods that are essential for semiconductor processing and thin film display applications. Beneq's expertise extends to precursor supply, gas distribution, and surface treatment, enabling the production of high-quality, etch-resistant films. With a strong focus on research and development, Beneq plays a pivotal role in enhancing the performance and reliability of various electronic components.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 27 2026

65 Patents

#2 in Vantaa

#56 in Finland

#11,346 in the World

Vantaa, Finland

Beneq Oy

Forward Citations = 61

51 inventors:

Pekka T Soininen (30 out of 95 patents)

Markku Rajala (8 out of 10 patents)

Johannes Wesslin (7 out of 7 patents)

4. Jarmo Maula (6 out of 13 patents)

5. Mika Jauhiainen (5 out of 5 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Beneq Oy. Retrieved from https://idiyas.com/company/beneq-oy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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