Jarmo Maula

This inventor holds 13 USPTO granted patents and 8 published patent applications, plus 1 CIPO patent and 5 EPO patents, primarily in Atomic Layer Deposition. Top assignees: Planar Systems, Inc., Beneq Oy. Active years: 2005-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jarmo Maula. Retrieved from https://idiyas.com/inventor/jarmo-maula

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 13 (Patent Applications = 8)

% Patents Active = 76.9

CIPO Patents = 1

EPO Patents = 5 (Patent Applications = 9)

Average Co-Inventor Count = 2.2

ph-index = 5

Forward Citations = 448(Granted Patents)

Company Filing History:

Years Active: 2005-2020

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Areas of Expertise:

Atomic Layer Deposition

Diaphragm Valve

Conductive Oxide Film

Precursor Material

Coating Method

Multilayer Material

Micro-Optical Elements

Reliability Enhancements

High-Temperature Supply

Metal Oxide Materials

13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10590536 - Apparatus, method and reaction chamber (2020-03-17),

2. 10167551 - Apparatus, method and reaction chamber (2019-01-01),

3. 9892814 - Method for forming an electrically conductive oxide film, an electrically conductive oxide film, and uses for the same (2018-02-13),

4. 9290840 - Method for forming an electrically conductive oxide film, an electrically conductive oxide film, and uses for the same (2016-03-22),

5. 8945676 - Method and apparatus for coating (2015-02-03),

6. 8367561 - Method in depositing metal oxide materials (2013-02-05),

7. 7901736 - Multilayer material and method of preparing same (2011-03-08),

8. 7294360 - Conformal coatings for micro-optical elements, and method for making the same (2007-11-13),

9. 7191793 - Diaphragm valve for atomic layer deposition (2007-03-20),

10. 7141095 - Precursor material delivery system for atomic layer deposition (2006-11-28),

11. 7021330 - Diaphragm valve with reliability enhancements for atomic layer deposition (2006-04-04),

12. 6941963 - High-speed diaphragm valve for atomic layer deposition (2005-09-13),

13. 6907897 - Diaphragm valve for high-temperature precursor supply in atomic layer deposition (2005-06-21),

Title: Jarmo Maula: Pioneering Innovator Shaping Future Technologies

Introduction:

Jarmo Maula is a visionary inventor known for his passion for innovation and relentless pursuit of excellence. Hailing from Espoo, Finland, Maula's contributions have solidified his position as a key figure shaping the landscape of technology for years to come.

Latest Patents:

Maula's latest patents showcase his innovative approach to technology. One of his recent inventions includes an apparatus, method, and reaction chamber designed for processing substrate surfaces through successive surface reactions of various precursors. The unique design features a gastight vessel, enhancing the efficiency and precision of surface processing.

Career Highlights:

With an impressive portfolio of 13 patents, Maula has made significant strides in the field of technology. Throughout his career, he has demonstrated a knack for developing cutting-edge solutions that push the boundaries of what is possible in the world of innovation. Maula's work has been instrumental in driving advancements in various industries.

Collaborations:

Maula has had the opportunity to collaborate with industry giants such as Planar Systems, Inc. and Beneq Oy. His partnerships with talented individuals like Kari Härkönen and Hannu Leskinen have led to the creation of groundbreaking technologies that have left a lasting impact on the field.

Conclusion:

In conclusion, Jarmo Maula's pioneering spirit and dedication to innovation have cemented his legacy as a visionary inventor. His relentless pursuit of excellence and unwavering commitment to pushing the boundaries of technology make him a significant force in shaping the future of technological advancements. With each new patent, Maula continues to inspire and drive innovation in the ever-evolving world of technology.

Profile summary based on public USPTO records.