The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2018

Filed:

Feb. 10, 2016
Applicant:

Beneq Oy, Vantaa, FI;

Inventor:

Jarmo Maula, Espoo, FI;

Assignee:

Beneq Oy, Vantaa, FI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01B 1/08 (2006.01); C23C 16/08 (2006.01); C23C 16/18 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 28/00 (2006.01); C23C 30/00 (2006.01); C23C 28/04 (2006.01);
U.S. Cl.
CPC ...
H01B 1/08 (2013.01); C23C 16/08 (2013.01); C23C 16/18 (2013.01); C23C 16/40 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/4408 (2013.01); C23C 16/45523 (2013.01); C23C 16/45525 (2013.01); C23C 16/45531 (2013.01); C23C 28/00 (2013.01); C23C 28/04 (2013.01); C23C 30/00 (2013.01);
Abstract

A method for forming an electrically conductive oxide film () on a substrate (), the method comprising the steps of, bringing the substrate () into a reaction space, forming a preliminary deposit on a deposition surface of the substrate () and treating the deposition surface with a chemical. The step of forming the preliminary deposit on the deposition surface of the substrate () comprises forming a preliminary deposit of transition metal oxide on the deposition surface and subsequently purging the reaction space. The step of treating the deposition surface with a chemical comprises treating the deposition surface with an organometallic chemical and subsequently purging the reaction space, to form oxide comprising oxygen, first metal and transition metal. The steps of forming the preliminary deposit and treating the deposition surface being alternately repeated such that a film () of electrically conductive oxide is formed on the substrate ().


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