The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2005
Filed:
Jun. 26, 2003
Jarmo Ilmari Maula, Espoo, FI;
Hannu Leskinen, Espoo, FI;
Teemu Lang, Helsinki, FI;
Pekka Kuosmanen, Espoo, FI;
Kari Härkönen, Kauniainen, FI;
Bradley J. Aitchison, Eugene, OR (US);
Jarmo Ilmari Maula, Espoo, FI;
Hannu Leskinen, Espoo, FI;
Teemu Lang, Helsinki, FI;
Pekka Kuosmanen, Espoo, FI;
Kari Härkönen, Kauniainen, FI;
Bradley J. Aitchison, Eugene, OR (US);
Planar Systems, Inc., Beaverton, OR (US);
Abstract
A diaphragm valve includes a pressure vent communicating with an enclosed space behind the diaphragm for reducing resistance to transitioning of the diaphragm between the open and closed positions. In some implementations, a pump or other source of suction is coupled to the pressure vent to reduce fluid pressure in the enclosed space. When used in an atomic layer deposition (ALD) system, the venting and suction improves the thin film deposition process and prevents leakage through the valve of potentially toxic ALD precursor vapors. Features for thermal management and reliability enhancement are also described.