Eugene, OR, United States of America

Bradley J Aitchison


Average Co-Inventor Count = 6.2

ph-index = 4

Forward Citations = 419(Granted Patents)


Company Filing History:


Years Active: 2005-2007

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5 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Bradley J Aitchison

Introduction

Bradley J Aitchison is a notable inventor based in Eugene, OR (US), recognized for his significant contributions to the field of atomic layer deposition technology. With a total of five patents to his name, Aitchison has made strides in developing advanced systems that enhance the efficiency and effectiveness of thin film deposition processes.

Latest Patents

Aitchison's latest patents include a diaphragm valve specifically designed for atomic layer deposition. This shut-off type diaphragm valve features a flexible diaphragm that can transition between an open and closed position, effectively controlling the flow within the system. The design facilitates heat transfer between the valve seat and the diaphragm, ensuring optimal operating temperatures. Another notable patent is the precursor material delivery system for atomic layer deposition. This system establishes a flow path from a precursor container to the reaction space, incorporating a staging volume that allows for precise dosing of precursor material. The system is designed to minimize particle contamination and enhance the overall performance of the deposition process.

Career Highlights

Aitchison's career is marked by his role at Planar Systems, Inc., where he has been instrumental in advancing technologies related to atomic layer deposition. His innovative designs and solutions have contributed to the company's reputation as a leader in the field.

Collaborations

Throughout his career, Aitchison has collaborated with talented individuals such as Jarmo Maula and Hannu Leskinen. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Bradley J Aitchison's work exemplifies the spirit of innovation in the field of atomic layer deposition. His patents and contributions continue to influence the industry, showcasing the importance of creativity and collaboration in technological advancement.

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