Teemu Lang

Title: Teemu Lang: Innovator in Thin Film Technology

Introduction

Teemu Lang is a prominent inventor based in Helsinki, Finland. He has made significant contributions to the field of thin film technology, holding a total of eight patents. His innovative work focuses on processes that enhance the deposition of carbon and transition metal-containing thin films.

Latest Patents

One of Lang's latest patents involves a process for depositing a carbon- and transition metal-containing thin film on a substrate. This process includes placing a substrate within a reaction space and sequentially pulsing a transition metal chemical and an organometallic chemical into the reaction space. After each chemical pulse, the reaction space is purged, and the sequence is repeated until the desired film thickness is achieved. This preferred deposition process utilizes atomic layer deposition techniques, resulting in an electrically conductive thin carbide film with uniform thickness, excellent adhesion, and step coverage properties.

Another notable patent is for a diaphragm valve designed for atomic layer deposition systems. This shut-off type diaphragm valve features a flexible diaphragm that can flex between an open and closed position. In the closed position, a substantial portion of the diaphragm presses against a valve seat, blocking the valve passage and facilitating heat transfer. The design includes a heating body that thermally contacts the valve body, maintaining an operating temperature at the diaphragm.

Career Highlights

Teemu Lang has worked with several notable companies throughout his career, including Planar Systems, Inc. and Intel Corporation. His experience in these organizations has contributed to his expertise in thin film technology and atomic layer deposition processes.

Collaborations

Lang has collaborated with several professionals in his field, including Kari Härkönen and Jarmo Maula. These collaborations have likely enriched his work and contributed to the advancements in the technologies he has developed.

Conclusion

Teemu Lang is a distinguished inventor whose work in thin film technology has led to significant advancements in the field. His innovative patents and career experiences reflect his commitment to enhancing deposition processes and materials.