The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2007
Filed:
Aug. 15, 2003
Kari Härkönen, Kauniainen, FI;
Mark Doczy, Beaverton, OR (US);
Teemu Lang, Helsinki, FI;
Nathan E. Baxter, Portland, OR (US);
Kari Härkönen, Kauniainen, FI;
Mark Doczy, Beaverton, OR (US);
Teemu Lang, Helsinki, FI;
Nathan E. Baxter, Portland, OR (US);
Planar Systems, Inc., Beaverton, OR (US);
Abstract
A process depositing a carbon- and transition metal-containing thin film on a substrate involves placing a substrate within a reaction space and sequentially pulsing into the reaction space a transition metal chemical and an organometallic chemical. Following each chemical pulse, the reaction space is purged, and the pulse and purge sequence is repeated until a desired film thickness is obtained. A preferred deposition process uses atomic layer deposition techniques and may result in an electrically conductive thin carbide film having uniform thickness over a large substrate area and excellent adhesion and step coverage properties.