The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Jun. 26, 2020
Applicant:
Beneq Oy, Espoo, FI;
Inventors:
Hulda Aminoff, Espoo, FI;
Pekka Soininen, Espoo, FI;
Pekka J. Soininen, Espoo, FI;
Ville Miikkulainen, Espoo, FI;
Assignee:
BENEQ OY, Espoo, FI;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/448 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/448 (2013.01); C23C 16/455 (2013.01); C23C 16/45544 (2013.01); C23C 16/45561 (2013.01);
Abstract
A precursor source arrangement for an atomic layer deposition apparatus for receiving a liquid precursor container for liquid precursor. The precursor source arrangement includes a precursor container support arrangement arranged to hold the liquid precursor container in inclined position relative to vertical direction.
Quick Actions:
Aminoff, Hulda. (2026). Precursor source arrangement and atomic layer deposition apparatus (U.S. Patent No. 12716130). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12716130
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile