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Asm Japan K.k.

USPTO Granted Patents = 194

Forward Citations = 34,404

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131 inventors (with patents filed for the assignee):

Nobuo Matsuki (36 out of 36 patents)

Atsuki Fukazawa (30 out of 79 patents)

Akira Shimizu (28 out of 122 patents)

4. Yoshinori Morisada (17 out of 17 patents)

5. Takayuki Yamagishi (17 out of 37 patents)

6. Kiyoshi Satoh (16 out of 16 patents)

7. Hideaki Fukuda (14 out of 61 patents)

8. Naoto Tsuji (13 out of 34 patents)

9. Satoshi Takahashi (12 out of 141 patents)

10. Masahiro Takizawa (11 out of 86 patents)

11. Masaei Suwada (11 out of 15 patents)

12. Yasuyoshi Hyodo (10 out of 15 patents)

13. Michael A Todd (9 out of 44 patents)

14. Kamal Kishore Goundar (9 out of 9 patents)

15. Yukihiro Mori (8 out of 118 patents)

Core Competencies:

Semiconductor Processing

Atomic Layer Deposition

Plasma Treatment

Dielectric Film Formation

CVD Techniques

Wafer Transport

Conformal Films

Metal Oxide Hardmask

Robot Diagnostic Module

Silicon Carbide Films

Porous Insulation Films

Inspection Techniques

194 patents: Sort by Forward Citations

1. 9793148 - Method for positioning wafers in multiple wafer transport (2017-10-17),

2. 9312155 - High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules (2016-04-12),

3. 9171716 - Method of forming metal oxide hardmask (2015-10-27),

4. 8901016 - Method of forming metal oxide hardmask (2014-12-02),

5. 8845806 - Shower plate having different aperture dimensions and/or distributions (2014-09-30),

6. 8765233 - Method for forming low-carbon CVD film for filling trenches (2014-07-01),

7. 8758514 - Cluster type semiconductor processing apparatus (2014-06-24),

8. 8669185 - Method of tailoring conformality of Si-containing film (2014-03-11),

9. 8666551 - Semiconductor-processing apparatus equipped with robot diagnostic module (2014-03-04),

10. 8647722 - Method of forming insulation film using plasma treatment cycles (2014-02-11),

11. 8592005 - Atomic layer deposition for controlling vertical film growth (2013-11-26),

12. 8569184 - Method for forming single-phase multi-element film by PEALD (2013-10-29),

13. 8563443 - Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen (2013-10-22),

14. 8551892 - Method for reducing dielectric constant of film using direct plasma of hydrogen (2013-10-08),

15. 8470187 - Method of depositing film with tailored comformality (2013-06-25),

ASM Japan K.K. is a leading provider of innovative semiconductor solutions. With a focus on advanced process technologies and manufacturing expertise, ASM Japan offers a wide range of products and services to the semiconductor industry. Through their cutting-edge technologies and commitment to customer satisfaction, ASM Japan helps companies achieve higher performance and profitability in their semiconductor manufacturing processes.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

194 Patents

#316 in Tokyo

#701 in Japan

#4,222 in the World

Asm Japan K.k.

Forward Citations = 34,404

131 inventors:

Nobuo Matsuki (36 out of 36 patents)

Atsuki Fukazawa (30 out of 79 patents)

Akira Shimizu (28 out of 122 patents)

4. Yoshinori Morisada (17 out of 17 patents)

5. Takayuki Yamagishi (17 out of 37 patents)

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