The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Nov. 13, 2009
Applicants:
Akiko Kobayashi, Tokyo, JP;
Akira Shimizu, Tokyo, JP;
Kuo-wei Hong, Tokyo, JP;
Nobuyoshi Kobayashi, Tokyo, JP;
Atsuki Fukazawa, Tama, JP;
Inventors:
Akiko Kobayashi, Tokyo, JP;
Akira Shimizu, Tokyo, JP;
Kuo-wei Hong, Tokyo, JP;
Nobuyoshi Kobayashi, Tokyo, JP;
Atsuki Fukazawa, Tama, JP;
Assignee:
ASM Japan K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
A film forming cycle based on pulse CVD or ALD is repeated multiple times to form a single layer of insulation film, while a reforming cycle is implemented in the aforementioned process, either once or multiple times per each film forming cycle, by treating the surface of formed film using a treating gas that has been activated by a plasma.
Published as: