Tokyo, Japan

Kuo-wei Hong

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Asm Japan K.k.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kuo-wei Hong. Retrieved from https://idiyas.com/inventor/kuo-wei-hong-26s5eni0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 531(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Kuo-wei Hong: Innovator in Plasma Treatment Technology

Introduction

Kuo-wei Hong is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of insulation films through innovative methods.

Latest Patents

Kuo-wei Hong holds a patent for a "Method of forming insulation film using plasma treatment cycles." This patent describes a film forming cycle based on pulse Chemical Vapor Deposition (CVD) or Atomic Layer Deposition (ALD) that is repeated multiple times to create a single layer of insulation film. Additionally, a reforming cycle is implemented in this process, which involves treating the surface of the formed film with a treating gas activated by plasma.

Career Highlights

Kuo-wei Hong is currently employed at ASM Japan K.K., where he continues to advance his research and development efforts in the field of plasma treatment technologies. His work has been instrumental in enhancing the efficiency and effectiveness of insulation film production.

Collaborations

Kuo-wei collaborates with talented coworkers, including Akiko Kobayashi and Akira Shimizu, who contribute to the innovative environment at ASM Japan K.K.

Conclusion

Kuo-wei Hong's contributions to the field of insulation film technology through his patented methods highlight his role as a leading inventor in the industry. His work continues to influence advancements in materials science and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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