The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Dec. 21, 2011
Applicants:
Jeongseok Ha, Tama, JP;
Hideaki Fukuda, Hachioji, JP;
Shintaro Kaido, Machida, JP;
Inventors:
Assignee:
ASM Japan K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/228 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02153 (2013.01); H01L 21/02186 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01); H01L 21/0337 (2013.01);
Abstract
A method of forming a metal oxide hardmask on a template includes: providing a template constituted by a photoresist or amorphous carbon formed on a substrate; and depositing by atomic layer deposition (ALD) a metal oxide hardmask on the template constituted by a material having a formula SiMOwherein M represents at least one metal element, x is less than one including zero, and y is approximately two or a stoichiometrically-determined number.
Published as:
US2012164846A1; KR20120075397A; JP2012142574A; US8901016B2; US2015056540A1; US9171716B2; JP5913965B2; KR20180002566A; KR101849500B1; KR101866567B1;