The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2014
Filed:
Jul. 30, 2010
Shigeyuki Onizawa, Tama, JP;
Woo-jin Lee, Tama, JP;
Hideaki Fukuda, Hachioji, JP;
Kunitoshi Namba, Machida, JP;
Shigeyuki Onizawa, Tama, JP;
Woo-Jin Lee, Tama, JP;
Hideaki Fukuda, Hachioji, JP;
Kunitoshi Namba, Machida, JP;
ASM Japan K.K., Tokyo, JP;
Abstract
A method of tailoring conformality of a film deposited on a patterned surface includes: (I) depositing a film by PEALD or pulsed PECVD on the patterned surface; (II) etching the film, wherein the etching is conducted in a pulse or pulses, wherein a ratio of an etching rate of the film on a top surface and that of the film on side walls of the patterns is controlled as a function of the etching pulse duration and the number of etching pulses to increase a conformality of the film; and (III) repeating (I) and (II) to satisfy a target film thickness.