Tokyo, Japan

Yukihiro Mori

This inventor holds 118 USPTO granted patents and 11 published patent applications and 61 EPO patents, primarily in Substrate Processing (CPC class B41J11-70). Top assignees: Fujitsu Component Limited, Asm IP Holding B.v., Asm Japan K.k.. Active years: 1998-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukihiro Mori. Retrieved from https://idiyas.com/inventor/yukihiro-mori

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 118 

% Patents Active = 61.9

 

Average Co-Inventor Count = 2.9

ph-index = 12

Forward Citations = 1,262(Granted Patents)

Forward Citations (Not Self Cited) = 1,168(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Iiyama, JP (1998 - 2002)
  • Tama, JP (1999 - 2005)
  • Shinagawa, JP (2004 - 2016)
  • Tokyo, JP (2004 - 2024)
  • Machida, JP (2016 - 2024)

Company Filing History:


Years Active: 1998-2025

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Areas of Expertise:
Gas Distribution Assembly
Flowable Gap-Fill
Substrate Processing
Thin Film Deposition
Cooling Device
Multi-Chamber Systems
Parts Cleaning
Sheet Cassette
Printing Apparatus
High-Throughput
Electronic Device
Rotating Substrate Support
118 patents (USPTO):Explore Patents

Title: Yukihiro Mori: The Trailblazing Inventor Revolutionizing Technology

Introduction:

Yukihiro Mori's unwavering passion for innovation and his tireless dedication to achieving excellence have positioned him as a pioneering inventor in the realm of technology. His groundbreaking work continues to serve as a source of inspiration for upcoming generations of inventors, encouraging them to dream big and challenge the boundaries of what is possible.

Latest Patents:

1. "Substrate processing apparatus and method of processing substrate": Mori's latest patent showcases a substrate processing apparatus that includes a stage within a chamber, a shower head with multiple slits facing the stage, a first gas supply part delivering a first gas between the stage and the shower head, and a second gas supply part providing a non-noble gas beneath the stage. The system optimizes substrate processing efficiency and precision.

2. "High-throughput, multi-chamber substrate processing system": This patent introduces a semiconductor processing system with multiple process module assemblies designed for sequential substrate loading. The arrangement ensures efficient processing and transfer of substrates across different modules, enhancing productivity and throughput.

Career Highlights:

Throughout his illustrious career, Yukihiro Mori has made significant contributions to the field of technology. He has worked with innovative companies such as Fujitsu Component Limited and ASM Japan K.K., shaping the landscape of semiconductor processing and substrate technology with his inventive solutions. With a total of 111 patents to his name, Mori's expertise and ingenuity have left an indelible mark on the industry.

Collaborations:

Mori's collaboration with esteemed colleagues like Sumio Watanabe and Masahiro Tsuchiya has been instrumental in driving forward technological advancements. Together, they have combined their unique skills and perspectives to tackle complex challenges, resulting in the development of cutting-edge solutions that have redefined the capabilities of substrate processing systems.

Conclusion:

In conclusion, Yukihiro Mori's innovative spirit and relentless pursuit of excellence have cemented his legacy as a trailblazing inventor in the world of technology. His remarkable patents, coupled with his impactful career highlights and fruitful collaborations, underscore his invaluable contributions to the field. Mori's work serves as a beacon of inspiration for current and future inventors, urging them to push the boundaries of innovation and strive for greatness in their pursuits.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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