The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Jul. 28, 2015
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Jun Kawahara, Tokyo, JP;

Suvi Haukka, Helsinki, FI;

Antti Niskanen, Helsinki, FI;

Eva Tois, Espoo, FI;

Raija Matero, Helsinki, FI;

Hidemi Suemori, Almere, NL;

Jaakko Anttila, Helsinki, FI;

Yukihiro Mori, Tokyo, JP;

Assignee:

ASM IP HOLDING B.V., Almere, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/4583 (2013.01); C23C 16/45544 (2013.01); C23C 16/52 (2013.01); C23C 16/54 (2013.01); H01L 21/67161 (2013.01); H01L 21/67167 (2013.01); H01L 21/67207 (2013.01); H01L 21/67745 (2013.01);
Abstract

In accordance with some embodiments herein, apparatuses for deposition of thin films are provided. In some embodiments, a plurality of stations is provided, in which each station provides a different reactant or combination of reactants. The stations can be in gas isolation from each other so as to minimize or prevent undesired chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) reactions between the different reactants or combinations of reactants.


Find Patent Forward Citations

Loading…