Helsinki, Finland

Raija H Matero

This inventor holds 34 USPTO granted patents and 2 published patent applications, primarily in Thin Film Deposition. Top assignees: Asm IP Holding B.v., Asm International N.v.. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raija H Matero. Retrieved from https://idiyas.com/inventor/raija-h-matero

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 34 

% Patents Active = 97.1

Average Co-Inventor Count = 2.9

ph-index = 7

Forward Citations = 1,532(Granted Patents)


Location History:

  • Vantaa, FI (2013 - 2014)
  • Helsinki, FI (2015 - 2024)

Company Filing History:


Years Active: 2013-2026

Loading Chart...
Areas of Expertise:
Selective Deposition
Thin Film Deposition
Atomic Layer Deposition
Oxide Thin Films
Metal Oxides
Hydrophobic Precursors
Cyclical Deposition
Germanium Films
Passivation
Dielectrics
Multi-Component Films
Antimony Oxide
34 patents (USPTO):Explore Patents

Title: Innovator Spotlight - Raija H Matero: Pioneering Dual Selective Deposition

Introduction:

Raija H Matero, a prolific inventor hailing from Helsinki, FI, has made a remarkable impact in the field of materials science and deposition technologies. With an impressive 28 patents to his name, Matero continues to push the boundaries of innovation and excellence in his work.

Latest Patents:

Matero's innovative spirit shines through in his latest patents. One notable invention is the "Dual Selective Deposition" method, which revolutionizes the process of depositing different materials on distinct surfaces of the same substrate. This breakthrough allows for the targeted deposition of materials such as metals, metal oxides, and dielectrics with precision and efficiency.

Another groundbreaking patent by Matero is the "Deposition of Oxide Thin Films" method. This technique enables the deposition of oxide films, including selective deposition of insulating metal oxide thin films on specific surfaces of a substrate. The ability to selectively deposit oxide thin films opens up new possibilities in the realm of material engineering and device fabrication.

Career Highlights:

During his illustrious career, Matero has made significant contributions to the industry through his work at renowned companies such as ASM IP Holding B.V. and ASM International N.V. His expertise and dedication have been instrumental in driving forward advancements in thin film technologies and surface engineering. Matero's innovative solutions have garnered recognition and acclaim within the scientific community and beyond.

Collaborations:

Matero has collaborated with esteemed professionals in his field, including his colleagues Suvi P Haukka and Eva E Tois. Through synergistic teamwork and shared expertise, Matero and his coworkers have been able to tackle complex challenges and develop cutting-edge solutions that pave the way for future innovation.

Conclusion:

In conclusion, Raija H Matero stands out as a trailblazing inventor whose creative vision and technical prowess have led to groundbreaking advancements in the field of materials science and deposition technologies. His commitment to excellence and collaboration underscores his status as a true pioneer in the industry, with a legacy that continues to inspire and drive progress in the ever-evolving world of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…