The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2022
Filed:
May. 27, 2021
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Suvi P. Haukka, Helsinki, FI;
Raija H. Matero, Helsinki, FI;
Eva Tois, Helsinki, FI;
Antti Niskanen, Helsinki, FI;
Marko Tuominen, Helsinki, FI;
Hannu Huotari, Helsinki, FI;
Viljami J. Pore, Helsinki, FI;
Assignee:
ASM IP HOLDING B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/06 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/02 (2006.01); C23C 16/30 (2006.01); C23C 16/56 (2006.01); H01L 21/285 (2006.01); H01L 21/768 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
C23C 16/04 (2013.01); C23C 16/02 (2013.01); C23C 16/06 (2013.01); C23C 16/18 (2013.01); C23C 16/22 (2013.01); C23C 16/30 (2013.01); C23C 16/402 (2013.01); C23C 16/405 (2013.01); C23C 16/407 (2013.01); C23C 16/408 (2013.01); C23C 16/45525 (2013.01); C23C 16/56 (2013.01); H01L 21/28562 (2013.01); H01L 21/76829 (2013.01); H01L 21/76849 (2013.01);
Abstract
Methods are provided for dual selective deposition of a first material on a first surface of a substrate and a second material on a second, different surface of the same substrate. The selectively deposited materials may be, for example, metal, metal oxide, or dielectric materials.