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For the Inventor, By the Inventor

Tama, Japan

Kiyoshi Satoh

USPTO Granted Patents = 16

Average Co-Inventor Count = 1.9

ph-index = 10

Forward Citations = 897(Granted Patents)


Location History:

  • Tokyo, JP (2000 - 2004)
  • Tama, JP (2000 - 2010)

Company Filing History:

goldMedal16 out of 194 
 
Asm Japan K.k.
 patents

Years Active: 2000-2010

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16 patents (USPTO):Explore Patents
1. 7718004 - Gas-introducing system and plasma CVD apparatus (2010-05-18),
2. 7638003 - Semiconductor processing apparatus with lift pin structure (2009-12-29),
3. 7534469 - Semiconductor-processing apparatus provided with self-cleaning device (2009-05-19),
4. 7520244 - Plasma treatment apparatus (2009-04-21),
5. 7271093 - Low-carbon-doped silicon oxide film and damascene structure using same (2007-09-18),
6. 7238393 - Method of forming silicon carbide films (2007-07-03),
7. 6991959 - Method of manufacturing silicon carbide film (2006-01-31),
8. 6919270 - Method of manufacturing silicon carbide film (2005-07-19),
9. 6815332 - Method for forming integrated dielectric layers (2004-11-09),
10. 6767836 - Method of cleaning a CVD reaction chamber using an active oxygen species (2004-07-27),
11. 6761771 - Semiconductor substrate-supporting apparatus (2004-07-13),
12. 6736147 - Semiconductor-processing device provided with a remote plasma source for self-cleaning (2004-05-18),
13. 6435798 - Semiconductor processing apparatus with substrate-supporting mechanism (2002-08-20),
14. 6235112 - Apparatus and method for forming thin film (2001-05-22),
15. 6113704 - Substrate-supporting device for semiconductor processing (2000-09-05),

Title: Kiyoshi Satoh: Innovator in Semiconductor Processing Technologies

Introduction

Kiyoshi Satoh, a renowned inventor based in Tama, Japan, has made significant contributions to the field of semiconductor processing. With an impressive portfolio of 16 patents, Satoh is recognized for his innovative solutions that enhance the efficiency and effectiveness of various semiconductor manufacturing processes.

Latest Patents

Among his latest patents are two noteworthy inventions:

1. **Gas-introducing system and plasma CVD apparatus** - This invention focuses on a gas-introducing system for plasma chemical vapor deposition (CVD) and cleaning. It features a showerhead designed with a top plate equipped with a gas inlet port and a shower plate. Additionally, a rectifying plate is incorporated to divide the interior space of the showerhead, facilitating active species maintenance and connection to a remote plasma unit.

2. **Semiconductor processing apparatus with lift pin structure** - This apparatus is designed to improve substrate handling within a reaction chamber. It includes a susceptor with through-holes that accommodate lift pins, allowing for precise lifting of substrates while minimizing contact resistance.

Career Highlights

Satoh's career at ASM Japan K.K. has been marked by continuous innovation. His work aims to overcome challenges faced in semiconductor processing, particularly in improving equipment reliability and performance.

Collaborations

Kiyoshi Satoh has collaborated with other talented professionals, including Kamal Kishore Goundar and Nelson Loke Chou San. These collaborations have fostered a dynamic environment for innovation and technological advancement within the semiconductor industry.

Conclusion

Kiyoshi Satoh's contributions to semiconductor processing demonstrate his commitment to innovation. With a robust portfolio of patents and impactful collaborations, Satoh continues to influence the development of advanced technologies in the field, solidifying his reputation as a leading inventor in Japan.

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