The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

May. 26, 2023
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Charles Dezelah, Helsinki, FI;

Petro Deminskyi, Helsinki, FI;

Qi Xie, Shanghai, CN;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2025.01); H10D 64/01 (2025.01);
U.S. Cl.
CPC ...
H10D 64/01318 (2026.01);
Abstract

Disclosed are methods and systems for depositing layers comprising a Group 13 element on a surface of a substrate via contacting the substrate with at least a vapor-phase first precursor and a vapor-phase second precursor comprising an alkyl halide. Exemplary structures in which the layers may be incorporated include field effect transistors, VNAND cells, and metal-insulator-metal (MIM).


Find Patent Forward Citations

Dezelah, Charles. (2026). Methods and systems for forming a layer comprising a group 13 element on a substrate (U.S. Patent No. 12628399). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12628399

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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