Helsinki, Finland

Petro Deminskyi

USPTO Granted Patents = 5 

Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2025

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

Title: Petro Deminskyi: Innovator in Advanced Material Deposition

Introduction

Petro Deminskyi is a prominent inventor based in Helsinki, Finland. He has made significant contributions to the field of material science, particularly in the development of methods for forming advanced layers used in various electronic devices. With a total of 5 patents to his name, Deminskyi continues to push the boundaries of innovation in his field.

Latest Patents

Deminskyi's latest patents include groundbreaking methods and systems for forming layers comprising aluminum, titanium, and carbon. These methods involve a cyclical deposition process that allows for the creation of layers on substrate surfaces. The resulting structures can be utilized in field effect transistors, VNAND cells, metal-insulator-metal (MIM) structures, and DRAM capacitors. Another notable patent focuses on methods for depositing layers of vanadium boride and vanadium phosphide. This process includes providing a vanadium precursor and a reactant to a reaction chamber, leading to the formation of structures that can serve as barrier layers, work function layers, or dipole shifter layers.

Career Highlights

Deminskyi is currently associated with Asm IP Holding B.V., where he applies his expertise in material deposition technologies. His work has been instrumental in advancing the capabilities of electronic components, making them more efficient and effective.

Collaborations

Deminskyi has collaborated with notable professionals in his field, including Charles Dezelah and Qi Xie. These partnerships have fostered innovation and have contributed to the successful development of his patented technologies.

Conclusion

Petro Deminskyi stands out as a key figure in the realm of advanced material deposition. His innovative patents and collaborations highlight his commitment to enhancing electronic device performance. His contributions continue to shape the future of material science and technology.

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