The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Nov. 21, 2022
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Charles Dezelah, Helsinki, FI;
Fei Wang, Phoenix, AZ (US);
Robin Scott, Phoenix, AZ (US);
Woo Jung Shin, Chandler, AZ (US);
Amin Azimi, Phoenix, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 7/04 (2006.01); C11D 7/34 (2006.01);
U.S. Cl.
CPC ...
C11D 7/3209 (2013.01); C11D 7/04 (2013.01); C11D 7/34 (2013.01); C11D 2111/20 (2024.01);
Abstract
A method of cleaning (e.g., selectively removing an oxide from) a surface of a substrate is disclosed. An exemplary method includes providing one or more of a haloalkylamine and a halogenated sulfur compound to a reaction chamber to selectively remove the silicon oxide from the surface.
Dezelah, Charles. (2026). Method for selectively removing oxide from a surface (U.S. Patent No. 12774432). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12774432
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile