The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2025

Filed:

Feb. 25, 2022
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Elina Färm, Helsinki, FI;

Shinya Iwashita, Helsinki, FI;

Charles Dezelah, Helsinki, FI;

Jan Willem Maes, Wilrijk, BE;

Timothee Blanquart, Oud-Heverlee, BE;

René Henricus Jozef Vervuurt, Leuven, BE;

Viljami Pore, Helsinki, FI;

Giuseppe Alessio Verni, Jodoigne, BE;

Qi Xie, Wilsele, BE;

Ren-Jie Chang, Leuven, BE;

Eric James Shero, Phoenix, AZ (US);

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76837 (2013.01); C23C 16/45553 (2013.01); H01L 21/0228 (2013.01);
Abstract

Disclosed are methods and systems for filling a gap. An exemplary method comprises providing a substrate to a reaction chamber. The substrate comprises the gap. The method further comprises at least partially filling the gap with a gap filling fluid. The methods and systems are useful, for example, in the field of integrated circuit manufacture.


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