Elina Färm

This inventor holds 20 USPTO granted patents and 10 published patent applications, primarily in Thin Film Deposition. Top assignees: Asm IP Holding B.v., Asm International N.v.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Elina Färm. Retrieved from https://idiyas.com/inventor/elina-färm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 (Patent Applications = 10)

% Patents Active = 85.0

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 443(Granted Patents)

Company Filing History:

Asm International N.v.

patents

Years Active: 2015-2026

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Areas of Expertise:

Oxide Thin Films

Transition Metal Deposition

Thin Film Techniques

Selective Passivation

Self-Assembled Monolayers

Hydrophobic Precursors

Atomic Layer Deposition

Microcontact Printing

Deposition Processes

Surface Engineering

Gap Filling Methods

Metallic Surfaces

20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12685118 - Methods and systems for filling a gap (2026-07-14),

2. 12685045 - Deposition of oxide thin films (2026-07-14),

3. 12630924 - Transition metal deposition method (2026-05-19),

4. 12406881 - Methods and systems for filling a gap (2025-09-02),

5. 12404583 - Transition metal nitride deposition method (2025-09-02),

6. 12365984 - Transition metal deposition processes and deposition assembly (2025-07-22),

7. 12170197 - Selective passivation and selective deposition (2024-12-17),

8. 12154785 - Deposition of oxide thin films (2024-11-26),

9. 12080548 - Selective deposition using hydrophobic precursors (2024-09-03),

10. 11885020 - Transition metal deposition method (2024-01-30),

11. 11885014 - Transition metal nitride deposition method (2024-01-30),

12. 11749523 - Methods for preparing self-assembled monolayers (2023-09-05),

13. 11495455 - Apparatus for forming self-assembled monolayers (2022-11-08),

14. 11430656 - Deposition of oxide thin films (2022-08-30),

15. 11174550 - Selective deposition on metal or metallic surfaces relative to dielectric surfaces (2021-11-16),

Title: Inventor Elina Färm: Revolutionizing Technology in Helsinki

Introduction: Elina Färm is a pioneering inventor based in Helsinki, Finland, known for her groundbreaking contributions to the field of technology.

Latest Patents: Elina Färm holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing her innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Elina Färm has worked with leading research institutions and technology companies, consistently pushing the boundaries of what is possible in the tech industry.

Collaborations: Throughout her career, Elina Färm has collaborated with top engineers, scientists, and designers, fostering a culture of innovation and creativity in all her projects.

Conclusion: Elina Färm's dedication to innovation and her relentless pursuit of technological advancement make her a true trailblazer in the field of inventions, inspiring future generations to think outside the box and create a better tomorrow.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

10 patents pending: