Location History:
- Toufen Town, Miaoli County, TW (2013)
- Toufen Town, TW (2011 - 2019)
- Miaoli County, TW (2018 - 2021)
Company Filing History:
Years Active: 2011-2026
Title: Innovations by Fan-Yi Hsu
Introduction
Fan-Yi Hsu is a prominent inventor based in Toufen Town, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 16 patents. His work focuses on improving the reliability and efficiency of interconnect structures in semiconductor devices.
Latest Patents
One of his latest patents is titled "Via anchor profile control." This innovation enhances the control of via anchor profiles in metals at a contact layer by slowing down the anchor etching process and introducing a passivation operation. By first passivating a metallic surface, etchants are prevented from dispersing along grain boundaries, which can distort the shape of the via anchor. An iterative scheme involving multiple cycles of alternating passivation and etching operations allows for the formation of optimal via anchor profiles. When a desirable anchor shape is achieved, it maintains the structural integrity of the vias, thereby improving the reliability of the interconnect structure.
Another notable patent is the "Apparatus and method of removing photoresist layer." This method involves introducing ozone toward a photoresist layer over a substrate. The ozone is decomposed into dioxygen and first atomic oxygen, which then reacts with the photoresist layer. An apparatus that performs this method is also disclosed, showcasing Hsu's innovative approach to semiconductor processing.
Career Highlights
Fan-Yi Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor technology. His expertise and innovative mindset have made him a valuable asset to the company.
Collaborations
Throughout his career, Hsu has collaborated with notable colleagues, including Matt Yeh and Da-Yuan Lee. These collaborations have further enriched his work and contributed to the advancements in the semiconductor field.
Conclusion
Fan-Yi Hsu's contributions to semiconductor technology through his innovative patents demonstrate his commitment to enhancing the reliability and efficiency of interconnect structures. His work continues to influence the industry and pave the way for future advancements.