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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11090696 B1

PDFFull Text
Date of Patent:
Aug. 17, 2021

Filed:

Nov. 25, 2019

Apparatus and method of removing photoresist layer

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Jui-Chuan Chang, Hsinchu County, TW;

Shao-Yen Ku, Hsinchu County, TW;

Wen-Chang Tsai, Hsinchu, TW;

Shang-Yuan Yu, Hsinchu, TW;

Chien-Wen Hsiao, Hsinchu, TW;

Fan-Yi Hsu, Miaoli County, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;

Attorney:

Maschoff Brennan

Primary Examiner:

Natasha N Campbell

Int. Cl.
CPC ...
B08B 7/00 (2006.01); H01L 21/67 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0057 (2013.01); H01L 21/31138 (2013.01); H01L 21/67115 (2013.01);
Abstract

A method includes introducing ozone toward a photoresist layer over a substrate. The ozone is decomposed into dioxygen and first atomic oxygen. The dioxygen is decomposed into second atomic oxygen. The first atomic oxygen and the second atomic oxygen are reacted with the photoresist layer. An apparatus that performs the method is also disclosed.

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Chang, Jui-Chuan. (2021). Apparatus and method of removing photoresist layer (U.S. Patent No. 11090696). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11090696

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