Jui-Chuan Chang

Title: Innovative Contributions of Jui-Chuan Chang in Semiconductor Technology

Introduction

Jui-Chuan Chang, located in Hsinchu, Taiwan, is a distinguished inventor with an impressive portfolio that includes seven patents. His innovations primarily focus on enhancing semiconductor manufacturing processes, specifically in the area of photoresist removal, which is critical for developing reliable electronic components.

Latest Patents

Among his latest patents, Jui-Chuan Chang developed a system for photoresist removal, essential for semiconductor wafers. This technique involves forming a photoresist over a wafer for patterning or material deposition, followed by its removal without causing damage to the underlying structures. His innovative approach utilizes activated trioxygen liquid, generated through various activators like ultraviolet light or hydrogen peroxide, to efficiently eliminate the photoresist. The process begins with an initial stripping using a sulfuric acid hydrogen peroxide mixture, followed by the application of activated trioxygen liquid to ensure thorough removal.

Another significant advancement is his patent on the apparatus and method of removing photoresist layers. This method introduces ozone to a photoresist layer atop a substrate, where it decomposes into dioxygen and atomic oxygen. The ensuing chemical reactions with the photoresist layer represent a crucial step in ensuring quality and efficacy in semiconductor device fabrication.

Career Highlights

Jui-Chuan Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading firm known for its unparalleled advancements in semiconductor technology. His contributions have been pivotal in improving fabrication techniques and ensuring that the devices manufactured meet the highest standards of efficiency and performance.

Collaborations

Throughout his career, Jui-Chuan has collaborated with seasoned professionals in the field. Notable coworkers, such as Shao-Yen Ku and Wen-Chang Tsai, have worked alongside him, contributing to the innovation and development of technologies that push the boundaries of semiconductor manufacturing processes.

Conclusion

Jui-Chuan Chang's work exemplifies the spirit of innovation in the semiconductor sector. His patents are vital for advancing photoresist removal techniques, ultimately leading to higher quality semiconductor devices. As a key player at TSMC, his dedication to research and development continues to inspire future breakthroughs in the industry.