Introduction: Wen-Chang Tsai is a prominent inventor based in Hsinchu, Taiwan, known for his significant contributions to the field of semiconductor technology. With a total of nine patents to his name, he has developed innovative solutions aimed at improving processes within the semiconductor manufacturing industry. His latest inventions reflect the cutting-edge advancements in material removal techniques, which are crucial for enhancing the efficiency and integrity of semiconductor devices.

Latest Patents: Among Wen-Chang Tsai's latest patents is a groundbreaking method for photoresist removal. This technology addresses the challenge of removing photoresist from semiconductor wafers without damaging the underlying structures. The patented process involves the use of a trioxygen liquid that is activated with an appropriate activator, such as ultraviolet light or hydrogen peroxide. This activation generates free radicals that effectively facilitate the removal of photoresist. The process begins with an initial strip using a sulfuric acid-hydrogen peroxide mixture, followed by the application of the activated trioxygen liquid to remove the remaining layers of photoresist. Additionally, Tsai has developed an apparatus to implement this method, which involves introducing ozone to the photoresist layer, leading to a decomposition reaction that integrally interacts with the photoresist.

Career Highlights: Wen-Chang Tsai is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor industry. His work not only showcases his technical expertise but also his commitment to advancing semiconductor manufacturing techniques. Tsai's innovative approaches have garnered attention in research and commercial applications, highlighting his prominent role in the sector.

Collaborations: Throughout his career, Tsai has collaborated with esteemed professionals such as Shao-Yen Ku and Jui-Chuan Chang. These collaborations further enrich the innovative process, fostering an environment of shared knowledge and expertise that drives the development of advanced technologies in semiconductor manufacturing.

Conclusion: Wen-Chang Tsai stands out as a key figure in semiconductor innovation with his impressive array of patents and contributions to the field. His dedication to developing effective solutions for photoresist removal underscores the importance of continuous innovation in technology. As semiconductor processes evolve, the work of inventors like Tsai will remain pivotal in shaping the future of the industry.

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