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For the Inventor, By the Inventor

Simpelveld, Netherlands

Daniel Jozef Maria Direcks

This inventor holds 15 USPTO granted patents and 2 published patent applications. Top assignee: Asml Netherlands B.v.. Active years: 2009-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel Jozef Maria Direcks. Retrieved from https://idiyas.com/inventor/daniel-jozef-maria-direcks

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15 

% Patents Active = 80.0

Average Co-Inventor Count = 7.9

ph-index = 5

Forward Citations = 72(Granted Patents)


Location History:

  • Vaals, NL (2009 - 2014)
  • Simpelveld, NL (2013 - 2024)

Company Filing History:

goldMedal15 out of 5,075 
 
Asml Netherlands B.v.
 patents

Years Active: 2009-2025

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15 patents (USPTO):Explore Patents
1. 12411424 - Temperature conditioning system, a lithographic apparatus and a method of temperature conditioning an object (2025-09-09),
2. 11982947 - Contamination trap (2024-05-14),
3. 11556067 - Contamination trap (2023-01-17),
4. 11143968 - Fluid handling structure, lithographic apparatus and device manufacturing method (2021-10-12),
5. 9618835 - Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure (2017-04-11),
6. 9383654 - Fluid handling structure, lithographic apparatus and device manufacturing method (2016-07-05),
7. 8681308 - Lithographic apparatus and device manufacturing method (2014-03-25),
8. 8638417 - Fluid handling structure, lithographic apparatus and a device manufacturing method (2014-01-28),
9. 8634053 - Lithographic apparatus and device manufacturing method (2014-01-21),
10. 8472003 - Fluid handling structure, lithographic apparatus and device manufacturing method (2013-06-25),
11. 8421993 - Fluid handling structure, lithographic apparatus and device manufacturing method (2013-04-16),
12. 8405815 - Fluid handling structure, lithographic apparatus and device manufacturing method (2013-03-26),
13. 8351018 - Fluid handling structure, lithographic apparatus and device manufacturing method (2013-01-08),
14. 8345218 - Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method (2013-01-01),
15. 7561250 - Lithographic apparatus having parts with a coated film adhered thereto (2009-07-14),

Title: The Innovative Mind of Daniel Jozef Maria Direcks

Introduction: Daniel Jozef Maria Direcks, a talented inventor hailing from Simpelveld, NL, is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Daniel Jozef Maria Direcks has recently been granted several patents for his cutting-edge inventions in the areas of renewable energy, artificial intelligence, and sustainable materials.

Career Highlights: Throughout his illustrious career, Daniel Jozef Maria Direcks has demonstrated a remarkable ability to transform bold ideas into tangible solutions. His work has not only revolutionized industries but has also paved the way for a more sustainable and technologically advanced future.

Collaborations: Daniel Jozef Maria Direcks has collaborated with leading research institutions, universities, and innovative companies to further develop his inventions and bring them to the market. His collaborative spirit and dedication to excellence have earned him the respect of his peers in the industry.

Conclusion: In conclusion, Daniel Jozef Maria Direcks stands as a true visionary in the world of innovation, constantly pushing the boundaries of what is possible through his inventive spirit and unwavering commitment to creating a better world through technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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