The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Jan. 31, 2011
Daniel Jozef Maria Direcks, Simpelveld, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Clemens Johannes Gerardus Van Den Dungen, Someren, NL;
Maikel Adrianus Cornelis Schepers, Nuenen, NL;
Sergei Shulepov, Eindhoven, NL;
Pieter Mulder, Duizel, NL;
David Bessems, Eindhoven, NL;
Marco Baragona, Delft, NL;
Daniel Jozef Maria Direcks, Simpelveld, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Clemens Johannes Gerardus Van Den Dungen, Someren, NL;
Maikel Adrianus Cornelis Schepers, Nuenen, NL;
Sergei Shulepov, Eindhoven, NL;
Pieter Mulder, Duizel, NL;
David Bessems, Eindhoven, NL;
Marco Baragona, Delft, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.