The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2013
Filed:
May. 07, 2009
Michel Riepen, Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Daniel Jozef Maria Direcks, Simpelveld, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Arnold Jan Van Putten, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Daniel Jozef Maria Direcks, Simpelveld, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Arnold Jan Van Putten, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.