The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Jun. 19, 2007
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Menno Fien, Tilburg, NL;
Erik Roelof Loopstra, Heeze, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Daniel Jozef Maria Direcks, Vaals, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Gert-jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Heerlen, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Menno Fien, Tilburg, NL;
Erik Roelof Loopstra, Heeze, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Daniel Jozef Maria Direcks, Vaals, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Gert-Jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Heerlen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.