The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Sep. 13, 2007
Paul Petrus Joannes Berkvens, Veldhoven, NL;
Roelof Frederik DE Graaf, Veldhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Daniel Jozef Maria Direcks, Vaals, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Paul William Scholtes-van Eijk, Eindhoven, NL;
Gert-jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Heerlen, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Mathieus Anna Karel Van Lierop, Eindhoven, NL;
Christophe DE Metsenaere, Eindhoven, NL;
Marcio Alexandre Cano Miranda, Waalre, NL;
Patrick Johannes Wilhelmus Spruytenburg, Eindhoven, NL;
Joris Johan Anne-marie Verstraete, Waalre, NL;
Paul Petrus Joannes Berkvens, Veldhoven, NL;
Roelof Frederik De Graaf, Veldhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Daniel Jozef Maria Direcks, Vaals, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Paul William Scholtes-Van Eijk, Eindhoven, NL;
Gert-Jan Gerardus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Heerlen, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Mathieus Anna Karel Van Lierop, Eindhoven, NL;
Christophe De Metsenaere, Eindhoven, NL;
Marcio Alexandre Cano Miranda, Waalre, NL;
Patrick Johannes Wilhelmus Spruytenburg, Eindhoven, NL;
Joris Johan Anne-Marie Verstraete, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.