The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
Jul. 21, 2009
Daniel Jozef Maria Direcks, Simpelveld, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Michel Riepen, Veldhoven, NL;
Clemens Johannes Gerardus Van Den Dungen, Eindhoven, NL;
Adrianes Johannes Baeten, Eindhoven, NL;
Fabrizio Evangelista, Eindhoven, NL;
Daniel Jozef Maria Direcks, Simpelveld, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Michel Riepen, Veldhoven, NL;
Clemens Johannes Gerardus Van Den Dungen, Eindhoven, NL;
Adrianes Johannes Baeten, Eindhoven, NL;
Fabrizio Evangelista, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.