The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Jun. 22, 2010
Hrishikesh Patel, Eindhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Daniel Jozef Maria Direcks, Simpelveld, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Paul Petrus Joannes Berkvens, Veldhoven, NL;
Gert-jan Geradus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Veldhoven, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Matheus Anna Karel Van Lierop, Eindhoven, NL;
Christophe DE Metsenaere, Eindhoven, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Patrick Johannes Wilhelmus Spruytenburg, Eindhoven, NL;
Joris Johan Anne-marie Verstraete, Waalre, NL;
Ruud Hendrikus Martinus Johannes Bloks, Helmond, NL;
Hrishikesh Patel, Eindhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Heeze, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Wilhelmus Franciscus Johannes Simons, Beesel, NL;
Daniel Jozef Maria Direcks, Simpelveld, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Paul Petrus Joannes Berkvens, Veldhoven, NL;
Gert-Jan Geradus Johannes Thomas Brands, Waalre, NL;
Koen Steffens, Veldhoven, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Matheus Anna Karel Van Lierop, Eindhoven, NL;
Christophe De Metsenaere, Eindhoven, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Patrick Johannes Wilhelmus Spruytenburg, Eindhoven, NL;
Joris Johan Anne-Marie Verstraete, Waalre, NL;
Ruud Hendrikus Martinus Johannes Bloks, Helmond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.