EPO Patents = 2

Average Co-Inventor Count = 3.7

ph-index = 13

Forward Citations = 478(Granted Patents)

Location History:

KS-Eersel, NL (2005 - 2009)
Aalen, DE (2001 - 2014)
Eersel, NL (2004 - 2015)
Duizel, NL (2013 - 2016)

Company Filing History:

13 out of 4,883

Asml Netherlands B.v.

Carl-zeiss-stiftung Trading As Carl Zeiss

patents

5. 1 out of 22

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Carl Zeiss Microscopy Gmbh

patents

Years Active: 2001-2016

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39 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9516732 - Radiation source (2016-12-06),

2. 9134629 - Illumination system, lithographic apparatus and method of forming an illumination mode (2015-09-15),

3. 9119280 - Radiation source (2015-08-25),

4. 8953141 - Immersion lithographic apparatus and device manufacturing method with asymmetric acceleration profile of substrate table to maintain meniscus of immersion liquid (2015-02-10),

5. 8901510 - Particle beam device having a detector arrangement (2014-12-02),

6. 8405825 - Method of detecting a particle and a lithographic apparatus (2013-03-26),

7. 7929116 - Polarized radiation in lithographic apparatus and device manufacturing method (2011-04-19),

8. 7859647 - Lithographic apparatus and device manufacturing method (2010-12-28),

9. 7663741 - Lithographic apparatus, device manufacturing method, calibration method and computer program product (2010-02-16),

10. 7605914 - Optical system and method for improving imaging properties thereof (2009-10-20),

11. RE40743 - Projection exposure system having a reflective reticle (2009-06-15),

12. 7382536 - Objective with fluoride crystal lenses (2008-06-03),

13. 7345740 - Polarized radiation in lithographic apparatus and device manufacturing method (2008-03-18),

14. 7317512 - Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method (2008-01-08),

15. 7312852 - Polarized radiation in lithographic apparatus and device manufacturing method (2007-12-25),

Title: Christian Wagner: A Visionary Inventor Revolutionizing Technology

Introduction:

Christian Wagner, a visionary inventor hailing from Eersel, NL, has made a significant mark in the world of technology with his innovative creations and groundbreaking patents.

Latest Patents:

With an impressive portfolio of 39 patents, Christian Wagner's latest inventions include a radiation source that generates a radiation generating plasma using laser technology, and an illumination system for lithographic apparatus that forms different illumination modes.

Career Highlights:

Having worked at renowned companies such as ASML Netherlands B.V. and Carl Zeiss SMT AG, Christian Wagner has honed his skills and expertise in the field of technology. His relentless pursuit of excellence has led to numerous breakthroughs in the industry.

Collaborations:

Throughout his career, Christian Wagner has collaborated with esteemed professionals such as Hubert Holderer and Karl-Heinz Schuster, further enhancing his innovative capabilities and pushing the boundaries of technology.

Conclusion:

Christian Wagner stands as a true pioneer in the world of inventions, with a legacy that will continue to inspire future generations of innovators. His dedication to creating a better world through technology makes him a luminary in the field, paving the way for a brighter and more innovative future.

This text is generated by artificial intelligence and may not be accurate.

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2 patents (EPO):

Please report any incorrect information to support@idiyas.com

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