The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2015
Filed:
Feb. 25, 2010
Erik Roelof Loopstra, Eindhoven, NL;
Koen Van Ingen Schenau, Veldhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Christian Wagner, Duizel, NL;
Gosse Charles DE Vries, Veldhoven, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Koen Van Ingen Schenau, Veldhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Christian Wagner, Duizel, NL;
Gosse Charles De Vries, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.