The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Jan. 28, 2008
Arno Jan Bleeker, Westerhoven, NL;
Johannes Jacobus Matheus Baselmans, Orischot, NL;
Marce Mathijs Theodore Marie Dierichs, Venlo, NL;
Stanislav Smirnov, Bethel, CT (US);
Christian Wagner, Eersel, NL;
Lev Ryzhikov, Norwalk, CT (US);
Kars Zeger Troost, Waalre, NL;
Arno Jan Bleeker, Westerhoven, NL;
Johannes Jacobus Matheus Baselmans, Orischot, NL;
Marce Mathijs Theodore Marie Dierichs, Venlo, NL;
Stanislav Smirnov, Bethel, CT (US);
Christian Wagner, Eersel, NL;
Lev Ryzhikov, Norwalk, CT (US);
Kars Zeger Troost, Waalre, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.