Venlo, Netherlands

Marce Mathijs Theodore Marie Dierichs

This inventor holds 1 USPTO granted patent. Top assignee: Asml Holding N.v.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marce Mathijs Theodore Marie Dierichs. Retrieved from https://idiyas.com/inventor/marce-mathijs-theodore-marie-dierichs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Marce Mathijs Theodore Marie Dierichs

Introduction:

Marce Mathijs Theodore Marie Dierichs, a talented inventor based in Venlo, Netherlands, has made significant contributions to the field of lithographic apparatus and device manufacturing. With a keen eye for innovation, Marce holds one patent that showcases his expertise in directing radiation beams for patterning arrays of controllable elements.

Latest Patents:

Marce's notable patent is for a lithographic apparatus and device manufacturing method, which involves directing a radiation beam to illuminate a patterning array of individually controllable elements. These elements can manipulate the telecentricity of the radiation beam, providing precise control over the patterning process. Whether using concave mirrors or folding mirrors, Marce's method ensures accurate projection onto the controllable elements.

Career Highlights:

Marce Mathijs Theodore Marie Dierichs is affiliated with ASML Holding N.V., a leading company in the semiconductor industry. ASML Holding N.V. is recognized for its cutting-edge technologies in photolithography equipment, and Marce's contributions further solidify the company's position as an industry innovator. Marce's innovative approach to lithographic processes has undoubtedly advanced the capabilities of ASML Holding N.V. in delivering high-quality solutions to its customers.

Collaborations:

Throughout his career, Marce has collaborated with esteemed colleagues such as Arno Jan Bleeker and Johannes Jacobus Matheus Baselmans. Together, they have synergized their expertise to drive innovation in lithographic technologies, pushing the boundaries of what is possible in the field.

Conclusion:

In conclusion, Marce Mathijs Theodore Marie Dierichs stands out as a visionary inventor whose work has significantly impacted the development of lithographic apparatus and device manufacturing methods. His patent reflects his dedication to excellence and his commitment to pushing the boundaries of technological advancement. Collaborating with industry experts, Marce continues to shape the future of lithography and semiconductor manufacturing, making him a valuable asset to ASML Holding N.V. and the broader innovation community.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…