Waalre, Netherlands

Kars Zeger Troost

This inventor holds 31 USPTO granted patents and 1 published patent application, primarily in Lithography Technology. Top assignees: Asml Netherlands B.v., Asml Holding N.v., Lsi Logic Corporation. Active years: 2006-2023.

USPTO Granted Patents = 31 

% Patents Active = 54.8

Average Co-Inventor Count = 3.0

ph-index = 8

Forward Citations = 181(Granted Patents)


Location History:

  • Waaire, NL (2006)
  • Westerhoven, NL (2007)
  • Waalre, NL (2006 - 2023)

Company Filing History:


Years Active: 2006-2023

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Areas of Expertise:
Lithographic Apparatus
Patterning Device
Dose Control
Maskless Lithography
Rasterization
Interferometric Exposure
Setpoint Data Optimization
Device Manufacturing Method
Light Patterning Device
Data Buffer
Computer Program Product
Superpixel Form
31 patents (USPTO):Explore Patents

Title: The Innovative Legacy of Inventor Kars Zeger Troost

Introduction:

In the dynamic world of technological advancements, few inventors shine as brightly as Kars Zeger Troost. With a remarkable track record of 31 patents to his name, his inventive spirit and commitment to pushing the boundaries of innovation have left an indelible mark on the industry. Let's delve into the world of this visionary inventor from Waalre, Netherlands.

Latest Patents:

1. Method for high numerical aperture thru-slit source mask optimization:

Kars Zeger Troost's method revolutionizes source mask optimization in lithographic projection apparatus. By determining a multi-variable source mask optimization function, accounting for imaging variations, and iteratively adjusting design variables, this patent paves the way for enhanced imaging precision.

2. Method of operating a patterning device and lithographic apparatus:

This patent showcases Troost's expertise in addressing distortions induced by heating in lithographic reticle illumination. By calculating distortions using reference marks and defining cells for solving equations to calculate dilations, Troost's innovation allows for precise corrections and modifications to the substrate patterning process.

Career Highlights:

Having worked with leading companies like ASML Netherlands B.V. and ASML Holding N.V., Kars Zeger Troost has contributed significantly to the development of cutting-edge technologies in the semiconductor industry. His innovative solutions have played a pivotal role in advancing lithographic processes and enhancing manufacturing efficiencies.

Collaborations:

In his journey of innovation, Troost has collaborated with esteemed colleagues such as Arno Jan Bleeker and Johannes Jacobus Matheus Baselmans. Through synergistic partnerships and a shared passion for technological advancement, they have worked together to realize inventive solutions that drive progress in the industry.

Conclusion:

Inventor Kars Zeger Troost stands as a beacon of creativity and ingenuity in the realm of inventions. His dedication to innovation, coupled with his impressive portfolio of patents, cements his legacy as a visionary inventor whose contributions continue to shape the technological landscape. Troost's relentless pursuit of excellence serves as an inspiration for aspiring inventors and underscores the transformative power of innovative thinking in driving industry progress.

Profile summary based on public USPTO records.
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