The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Jun. 18, 2008
Applicants:
Stefan Geerte Kruijswijk, Eindhoven, NL;
Rard Willem DE Leeuw, Eindhoven, NL;
Paul Frank Luehrmann, Santa Fe, NM (US);
Wim Tjibbo Tel, Helmond, NL;
Paul Jacques Van Wijnen, Veldhoven, NL;
Kars Zeger Troost, Waalre, NL;
Inventors:
Stefan Geerte Kruijswijk, Eindhoven, NL;
Rard Willem De Leeuw, Eindhoven, NL;
Paul Frank Luehrmann, Santa Fe, NM (US);
Wim Tjibbo Tel, Helmond, NL;
Paul Jacques Van Wijnen, Veldhoven, NL;
Kars Zeger Troost, Waalre, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03D 5/00 (2006.01); G01R 31/26 (2006.01); G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.